Editorial Type:
Article Category: Research Article
 | Online Publication Date: 05 Oct 2006
Process Improvement Using In-Situ Particle Detection
Process Improvement Using In-Situ Particle Detection
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Page Range: 21 – 24
An engineering criterion is derived to determine when the particle level detected in exhaust flow can be treated as a representiative measure of particle concentration in the reactor. It is established when gravitation sedimentation is the dominant phenomenon affecting particle deposition and when the particle distribution in the reactor is well-mixed. An example of using this technology to improve a plasma-en-hanced chemical vapor deposition process is presented.
Keywords: particle measurement; in situ; CVD; TEOS